光刻仿真软件：BOE-ziSIM助力工艺优化，提升制程良率

To achieve the desired results in lithography process, a large number of experiments are required to continuously optimize lithography process parameters. This not only increases economic and time costs, but also limits the development speed of new material process devices. To solve this problem, BOE-ziSIM has developed a lithography simulation module based on lithography process physical models. The software aims to design and optimize mask patterns and lithography process parameters to achieve the desired results.
\nBOE-ziSIM's lithography simulation software is divided into a simple version and an improved version. The simple version only requires the configuration of lithography line roughness and lithography resist functions. More detailed simulations require setting process layers, exposure parameters, post-baking and development time and temperature parameters, etc. Material types, material names, and thickness can be set in the process layers, and exposure wavelength, light source type, exposure focal length, aperture value, etc. can be set in the exposure parameters. These parameters can be set in the interface or imported from external data, making it convenient for researchers to use.
\nAfter setting the relevant parameters, the software can predict the characteristics of the lithography resist layer after exposure by calculating the exposure dose at different positions of the resist layer. It can also simulate the evolution process of the resist layer structure based on the chemical reaction kinetics parameters of the resist layer, predicting the morphology and thickness distribution of the resist layer.
\nLithography simulation not only allows forward prediction of process results, but also provides solutions for defects in the process, reducing process costs. Through lithography simulation, researchers can optimize the process before experimentation, reducing the number of experiments and material waste. At the same time, for problems and defects that occur in the process, the simulation software can provide solutions to help researchers quickly adjust process parameters and improve process yield. Currently, BOE-ziSIM's lithography simulation is mainly used in the manufacturing of new display thin-film transistors, with main users being BOE display panel manufacturers and semiconductor industry research institutions.