BOE-ziSIM 光刻仿真软件：加速新材料工艺器件开发

To achieve the desired results in lithography processes, a large number of experiments are required to continuously optimize lithography process parameters. This not only increases economic and time costs but also limits the development speed of new material process devices. To solve this problem, BOE-ziSIM has developed a lithography simulation module based on lithography process physical models. The software designs and optimizes mask patterns and lithography process parameters with the desired results as the goal.
\nBOE-ziSIM's lithography simulation software is divided into a basic version and an enhanced version. The basic version only requires configuring lithography line roughness and resist properties. More refined simulations require setting process layers, exposure parameters, post-baking and developing time and temperature parameters, etc. Material type, name, and thickness can be set in the process layer, while exposure wavelength, light source type, exposure focus, aperture value, etc., can be set in the exposure parameters. These parameters can be set in the interface or imported from external data, making it convenient for researchers to use.
\nAfter setting the relevant parameters, the software can calculate the exposure dose at different positions of the resist layer and predict the characteristics of the resist layer after exposure. It can also simulate the structural evolution process of the resist layer based on its chemical reaction kinetics parameters and predict the morphology and thickness distribution of the resist layer.
\nLithography simulation can not only predict process results but also provide solutions for defects in the process, thereby reducing process costs. Through lithography simulation, researchers can optimize the process before conducting experiments, reducing the number of experiments and material waste. At the same time, the simulation software can provide solutions for problems and defects that occur during the process, helping researchers quickly adjust process parameters and improve process yield. Currently, BOE-ziSIM's lithography simulation is mainly used in the manufacturing of new display thin-film transistors, with major users being BOE display panel manufacturers and semiconductor industry research institutions.