ITO Glass Cleaning and Surface Modification for Enhanced Device Fabrication

Before device fabrication, a small amount of detergent was applied onto a clean cloth and used to repeatedly wipe both sides of the ITO glass. The cleaned ITO glass was then placed on a wafer holder and subjected to ultrasonic cleaning with deionized water, acetone, and isopropanol for 15 minutes each. Afterwards, the ITO glass was transferred to an oven for 2 hours of drying and blown dry with nitrogen gas to ensure surface cleanliness. The ITO glass was then exposed to UV radiation for 15 minutes to increase its hydrophilicity and film-forming properties.