请将下面中文按照期刊格式翻译成英文并润色：将PEDOT PSS水溶液以4000 rpm均匀旋涂在ITO衬底上形成致密薄膜130℃退火20 min。以8 mgml Poly-TPD氯苯溶液作为孔转移层以4000 rpm旋涂在PEDOT PSS层上120℃退火10 min。CsPbBr3量子点层以2000 rpm的转速旋涂在手套箱中的Poly-TPD层上。最后通过热蒸发系统蒸发40 nm的TPBi层1

PEDOT: PSS solution was spin-coated onto an ITO substrate at 4000 rpm to form a dense film, followed by annealing at 130°C for 20 min. A 8 mg/ml Poly-TPD solution in chlorobenzene was then spin-coated onto the PEDOT: PSS layer at 4000 rpm and annealed at 120°C for 10 min as the hole transfer layer. CsPbBr3 quantum dot layer was spin-coated onto the Poly-TPD layer in a glove box at 2000 rpm. Finally, a 40 nm TPBi layer, a 1 nm LiF layer, and a 100 nm Al electrode were thermally evaporated.