The schematic configuration of the FLG-Si-FLG heterostructure waveguide PD is illustrated in Figure 1a. The FLG is partitioned into two segments with a gap between them, and it is positioned symmetrically over the silicon photonic waveguide to create an FLG-Si-FLG structure. The gap width chosen for the present design is wgap = 300 nm. Additionally, the FLG segments are connected to the corresponding metal electrodes, and sandwiched contact-structures of metal-graphene-metal are employed to achieve low contact resistance

Figure 1a illustrates the schematic configuration of the present FLG-Si-FLG heterostructure waveguide PD The FLG is divided into two parts with a gap between them where the gap width is chosen as wgap

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